Oxidation-free High Temperature Chamber Manufacturer

Oxidation-free High Temperature Chamber

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Oxidation-free high temperature chamber can prevent products from oxidation under high temperature. It is suitable for application in many industries, such as semiconductors, liquid crystal, electronic products and precision appliance.

Reference Standards

GB/T2423.2-2008 Environmental Testing for Electric and Electronic Products - Part 2: Test B: High Temperature Test Method
GJB150.3A-2009 Military Equipment Laboratory Environment Test Method Part 3: High Temperature Test
IEC68-2-2 Test B: Dry heat

Features

Self-developed temperature controller
A fuzzy adaptive PID control method, saving energy
Wide temperature control range
Small temperature fluctuation and deviation
Manually adjusted nitrogen flow and display of the float flowmeter scale
The solenoid valve controls the nitrogen flow to decrease when the temperature is stable (after oxygen content is reached)

Optional Function

Automatic regulation of inert gas flow by electronic flowmeter software
Online oxygen concentration analyzer

Specifications

Model		SNO-216		ESNO-216		SNO-512		SNO-512		SNO-1000		ESNO-1000
Effective Volume (L)		216				512				1000
Temp. Range (℃)	Min	RT 30
	Max	250	350	250	350	250	350	250	350	250	350	250	350
Temp. uniformity (℃)		≤1.0
Temp. fluctuation (℃)		≤ ±0.5
Temp. deviation (℃)		±1.0
Cooling rate (℃/min)		250℃ series, no load, from 225 ℃ to 60 ℃, ≤100min
		350℃ series, no load, from 350 ℃ to 60 ℃, ≤180min
Heating rate (℃/min)		no load, from RT 15 ℃ to 200 ℃, ≤60min
Residual oxygen concentration in the chamber		20 ppm minimum (depending on the purity of inert gas used)
Consumption of high-purity inert gas (N2) when the residual oxygen concentration in the chamber≤100ppm		≤60L/min (≤40min down to)				≤120L/min (≤40min down to)				≤240L/min (≤40min down to)
		≤14L/min (concentration maintaining)				≤28L/min (concentration maintaining)				≤56L/min (concentration maintaining)
Consumption of high-purity inert gas (N2) when the residual oxygen concentration in the chamber≤50ppm		≤60L/min (≤60min down to)				≤120L/min (≤60min down to)				≤240L/min (≤60min down to)
		≤20L/min (concentration maintaining)				≤40L/min (concentration maintaining)				≤80L/min (concentration maintaining)
Internal Dimensions(mm)	W	600				800				1000
	H	600				800				1000
	D	600				800				1000
External dimensions(mm)	W	860	960	1100	1200	1060	1160	1300	1400	1260	1360	1500	1600
	H	1430	1330	1510	1610	1530	1630	1710	1810	1730	1830	1910	2010
	D	1500	1400	1600	1700	1600	1700	1800	1900	1800	1900	2000	2100
Maximum power (not the sum of all power) (KW)		4.5	6.0	4.5	6.0	7.5	9.0	7.5	9.0	11.0	13.0	11.0	13.0
Leakage switch 4P (A)		16	16	16	16	16	20	16	20	25	25	25	25
Noise (dB)		Less than 65 dB (measured 500 mm from the display screen)